

1. Adopts specially‑customized pulse‑width laser processing tailored for wafer laser machining to improve kerf quality, with the heat‑affected‑zone (HAZ) below 2 μm
2. Multiple laser micromachining technologies are integrated to ensure processing efficiency and process quality; multiple cutting‑function selections
3. Equipped with a combined Mask‑and‑TOP‑HAT beam‑shaping module and a dual‑optical‑path processing module
4. High‑precision visual‑inspection system
5. Compatible with 8‑inch and 12‑inch wafers
6. Supports automatic loading and unloading, unattended fully‑automatic operation for mass production
Laser grooving machine for Low‑k, Non‑Low‑k and GaN wafers.
Machine Model | Automatic Wafer Laser Grooving Machine |
Wafer Size | 8inch、12inch |
Processing Speed | 100mm/s~600mm/s |
Processing Accuracy | ≤±3μm |
Travel Range | 600mm*600mm |
Laser | 532nm,25W |
Equipment Utilization | >0.95 |